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Copper Target 2012-11-07 03:00:46
Cu target Customization specification Purity: 99.95% Density: 8.92g/cm 3 Melting point:1084°C Application: Decorated film，Reflection film，Conductive film Our goal is to be your One Stop thi ...
Gold Target 2012-11-07 03:00:36
Customization specification We can manufacture our targets to tighter specifications for an extra fabrication charge. Purity: 99.99% Density: 19.3g/cm 3 Melting point:1064°C Application: Conduc ...
Al Target 2012-11-07 03:00:29
Customization specification Purity: 99.999% Density: 2.7g/cm 3 Melting point:660°C Application: Decorated film，Reflection film We are committed to 100% customer satisfaction. Our sales engineer ...
Metal Targets 2012-11-07 03:00:22
SiAl target Materials are available in purities ranging from 99.9% to 99.9999% and are available for all sputtering systems – round, rectangular, S-Gun, Delta, and Ring. Custom designs are also a ...
Optical Coatings 2012-11-07 02:59:48
Zr target Used for processing molybdenum disks, and foils. They are used in high-temperature vacuum and hydrogen-atmosphere furnace construction Package: Wooden case with foam board Specificati ...
Optical Coating 2012-11-07 03:00:00
ZnS target Sputtering targets are produced for use in the sputtering of precious metals and magnetic materials, thereby increasing target utilization. Through engineering design, the enhanc ...
ZnO Target 2012-11-07 02:59:36
We utilize a variety of specialized processing techniques such as hot pressing, hot isostatic pressing (HIP), cold isostatic pressing (CIP), induction vacuum melting, and vacuum casting to produce ...
Metal Target 2012-11-07 02:59:27
ZnAl target From standard, single element materials to custom compounds, small circular to multi-tile and stepped constructions, commercial grade to ultra-high purities, Angstrom Sciences provide ...
Thin Film Optical 2012-11-07 02:59:12
Y2O3 target Because all of our alloys are made in house in one of our many vacuum induction systems, we can formulate the exact alloy you need for your physical deposition requirement. A full ana ...
Coating Thin Film 2012-11-07 02:58:44
TiW target We provide comprehensive support for sputtering processes, including recovery and recycling of scrap and recovery of precious metals on parts. Specification: Customization specificati ...
Optical Thin Film 2012-11-07 02:57:13
TiW target The alloy composition and added oxides have become more complicated than before because of increased hard disk capacity. With our technology, it is possible to manufacture targets that ...
Ti Target 2012-11-07 02:57:03
Customization specification Targets with finely and uniformly distributed oxides have fewer particles which enables stable sputtering. Specification: Application: Film material Purity: 99.9%& ...
Ta Target 2012-11-07 02:56:57
Customization specification Our company manufactures extremely high-grade sputtering targets containing oxides for high-quality recording media by utilizing a unique manufacturing method that ena ...
Optical Thin Films 2012-11-07 02:56:50
SiO2 target As a leading company of sputtering materials, our company will continue to meet or exceed our customer's expectations in the field of increasingly sophisticated thin film electronics. ...
Optical Thin Film Coating 2012-11-07 02:56:36
Si target Precious metal thin film materials manufactured with our sintering technology are highly regarded in the electronics industry, particularly in the semiconductor and magnetic disk indust ...
Si Target 2012-11-07 02:56:29
Sputtering Target Material: Titanium(Ti), Tungsten(W), Molybdenum(Mo), Tantalum(Ta), Niobium(Nb), Silver(Ag), Silicon(Si), Aluminum(Al) Chromium(Cr), Oxide sputtering target, Carbide sputtering ta ...
Silicon Target 2012-11-07 02:56:23
Packing︰ vacuum specification︰ high pure Magnesium metal, Magnesium oxide, Magnesium fluoride advantage︰ very competitory price and high quality with quickly delivery time ...
Sputter Coater 2012-11-07 02:56:14
Pt target Concerning other impurities than Ta and oxygen in the sputtering target of the present invention, up to an approximate level of general-purpose high purity metal material, a slight amou ...
Sputter Coating 2012-11-07 02:56:07
Os target The sputtering target of the present invention can be manufactured in the following ways for instance. Customization specification Specification: Purity: 99.99% Density: 22.661g/cm 3 ...
Sputter PVD 2012-11-07 02:55:51
NiV target A sputtering target of the present invention consists of high purity Nb. It is said that an amount of impurity element in the sputtering target is generally desirable to reduce. In the ...
PVD Sputter 2012-11-07 02:55:27
NiCr target The manufacture of silicide and alloy targets far more homogeneous and finer in structures than conventional products is now possible. In the case of silicide targets, metal silicide ...
PVD Sputtering 2012-11-07 02:55:17
NiCr target The present invention relates to a technique of fabricating targets for sputtering use, and more specifically to a method of manufacturing sputtering targets characterized by pressing ...
Ni Target 2012-11-07 02:55:11
A method of manufacturing metal silicide targets or alloy targets for sputtering use comprises the steps of (a) mechanically alloying silicon and a metal to provide a metal silicide powder or mech ...
Nb Target 2012-11-07 02:54:29
Application Bonding for various metal targets. Bonding for hard and crispy ceramic target. Bonding for target employed in large scale display. Specification: Purity: 99.995% Density ...
Target PVD 2012-11-07 02:53:55
The key to its added value is literally the flexibility of its decorative film color. It primarily increases the brightness of color and the hardness of the products themselves, while also reducin ...
PVD Targets 2012-11-07 02:53:46
The most advanced sputtering target products made by hot isostatic pressure. They have four characteristics I. E. High purity, high density, good organization structure, long life-span, they are t ...
ITO Target 2012-11-07 02:53:39
There is a comprehensive and increasing kinds of oxide material, these oxide material are use in Ceramic, Thin film coating, IC, Optical, Optical Communication, Electronics, Enamelling, Display in ...
Thin Film Sputter 2012-11-07 02:53:32
Packing: Wooden case or as your requirement We can also produce other shape molybdenum slice according to customers requirement and drawing Customization specification Specification: In2O3 targe ...
Thin Film Sputtering 2012-11-07 02:53:24
High purity metal sputtering target material (3N-6N): Aluminum target, chromium target, copper target, nickel target, silicon target, germanium target, niobium target, titanium target, indium targ ...
Ge Target 2012-11-07 02:52:37
High quality, favorable price and great service Please feel free to contact! Give us your draws, we can offer you the products with low price. Specification: Pervious range: 1700-2500 nm Densit ...