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Sputter PVD
| Item No.: | ST21 |
Supplier Details
Country: Taiwan
City: HsinChu
Address: No.16, Ln.727, Sec.2, Yen-ping Road
TEL: +886-03-5304953
Fax: +886-03-5362817
Online Showroom:
39 Products
NiV target
A sputtering target of the present invention consists of high purity Nb. It is said that an amount of impurity element in the sputtering target is generally desirable to reduce. In the present invention, an impurity element influencing particularly on characteristics of a Nb film deposited with a Nb target of the present invention is found. Based on the above finding, an amount of a particular element is reduced and dispersion of the amount of the impurity element is suppressed low.
Customization specification
Specification:
Application: protect film
A sputtering target of the present invention consists of high purity Nb. It is said that an amount of impurity element in the sputtering target is generally desirable to reduce. In the present invention, an impurity element influencing particularly on characteristics of a Nb film deposited with a Nb target of the present invention is found. Based on the above finding, an amount of a particular element is reduced and dispersion of the amount of the impurity element is suppressed low.
Customization specification
Specification:
Application: protect film