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Thin Film Sputtering
| Item No.: | ST12 |
Supplier Details
Country: Taiwan
City: HsinChu
Address: No.16, Ln.727, Sec.2, Yen-ping Road
TEL: +886-03-5304953
Fax: +886-03-5362817
Online Showroom:
39 Products
High purity metal sputtering target material (3N-6N):
Aluminum target, chromium target, copper target, nickel target, silicon target, germanium target, niobium target, titanium target, indium target, silver target, tin target, graphite target, tantalum target, molybdenum target, gold target, hafnium target, manganese target, zirconium target, magnesium target, zinc target, lead target, iridium target, yttrium target, cerium target, lanthanum target, ytterbium target, gadolinium target, platinum target, etc
Specification:
HfO2 target
Purity: 99.99%
Pervious range: 230-7,000 nm
Density: 9.68g/cm3
Refraction: 2.00/550 nm
Melting point: 2,774°C
Application: optical thin films .UV film. Mirror
Customization specification
Aluminum target, chromium target, copper target, nickel target, silicon target, germanium target, niobium target, titanium target, indium target, silver target, tin target, graphite target, tantalum target, molybdenum target, gold target, hafnium target, manganese target, zirconium target, magnesium target, zinc target, lead target, iridium target, yttrium target, cerium target, lanthanum target, ytterbium target, gadolinium target, platinum target, etc
Specification:
HfO2 target
Purity: 99.99%
Pervious range: 230-7,000 nm
Density: 9.68g/cm3
Refraction: 2.00/550 nm
Melting point: 2,774°C
Application: optical thin films .UV film. Mirror
Customization specification