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PVD Sputtering
| Item No.: | ST19 |
Supplier Details
Country: Taiwan
City: HsinChu
Address: No.16, Ln.727, Sec.2, Yen-ping Road
TEL: +886-03-5304953
Fax: +886-03-5362817
Online Showroom:
39 Products
NiCr target
The present invention relates to a technique of fabricating targets for sputtering use, and more specifically to a method of manufacturing sputtering targets characterized by pressing a metal silicide powder or metal alloy powder obtained by mechanical alloying. The invention relates also to the targets so made. Examples of metal alloys are the alloys of refractory metals, especially W--Ti alloys and other Ti-containing refractory metal alloys.
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Customization specification
Specification:
Application: optical thin films .protect film
The present invention relates to a technique of fabricating targets for sputtering use, and more specifically to a method of manufacturing sputtering targets characterized by pressing a metal silicide powder or metal alloy powder obtained by mechanical alloying. The invention relates also to the targets so made. Examples of metal alloys are the alloys of refractory metals, especially W--Ti alloys and other Ti-containing refractory metal alloys.
|
Customization specification
Specification:
Application: optical thin films .protect film