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Optical Coating
| Item No.: | ST35 |
Supplier Details
Country: Taiwan
City: HsinChu
Address: No.16, Ln.727, Sec.2, Yen-ping Road
TEL: +886-03-5304953
Fax: +886-03-5362817
Online Showroom:
39 Products
ZnS target
Sputtering targets are produced for use in the sputtering of precious metals and magnetic materials, thereby increasing target utilization. Through engineering design, the enhanced profile provides utilization factors far in excess of those conventionally found in planar designed targets.
Specification:
Purity: 99.99%
Pervious range: 400-14,000 nm
Density: 4.09g/cm3
Refraction: 2.35/550 nm
Melting point: 1,700°C
Application: .Optical thin films .AR film.
Customization specification
Sputtering targets are produced for use in the sputtering of precious metals and magnetic materials, thereby increasing target utilization. Through engineering design, the enhanced profile provides utilization factors far in excess of those conventionally found in planar designed targets.
Specification:
Purity: 99.99%
Pervious range: 400-14,000 nm
Density: 4.09g/cm3
Refraction: 2.35/550 nm
Melting point: 1,700°C
Application: .Optical thin films .AR film.
Customization specification